Nova Measuring Instruments (NASDAQ:NVMI) issued an update on its third quarter earnings guidance on Wednesday morning. The company provided earnings per share (EPS) guidance of $0.20-0.34 for the period, compared to the Thomson Reuters consensus estimate of $0.31. The company issued revenue guidance of $46-54 million, compared to the consensus revenue estimate of $53.00 million.
NASDAQ:NVMI opened at $26.87 on Wednesday. The stock’s 50-day simple moving average is $26.40. The company has a market cap of $792.53 million, a P/E ratio of 13.71 and a beta of 1.05. Nova Measuring Instruments has a 52 week low of $20.83 and a 52 week high of $30.46.
NVMI has been the subject of a number of analyst reports. ValuEngine raised shares of Nova Measuring Instruments from a hold rating to a buy rating in a report on Tuesday, July 23rd. Needham & Company LLC initiated coverage on shares of Nova Measuring Instruments in a report on Tuesday, April 16th. They set a buy rating and a $33.00 price objective for the company. BidaskClub raised shares of Nova Measuring Instruments from a hold rating to a buy rating in a report on Friday, August 2nd. Zacks Investment Research raised shares of Nova Measuring Instruments from a strong sell rating to a hold rating in a report on Wednesday, July 3rd. Finally, Lake Street Capital reaffirmed a buy rating and set a $30.00 price objective (up from $28.00) on shares of Nova Measuring Instruments in a report on Thursday, May 2nd. One equities research analyst has rated the stock with a hold rating and five have assigned a buy rating to the company. The stock has an average rating of Buy and a consensus target price of $32.25.
Nova Measuring Instruments Ltd. designs, develops, produces, and sells process control systems used in the manufacture of semiconductors in Israel. Its product portfolio includes integrated and stand-alone metrology platforms for dimensional, films, and material metrology measurements for process control across various semiconductor manufacturing process steps, including lithography, etch, chemical mechanical planarization, and deposition.
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